Sensor device/material optoelectronic design and testing capabil
  • Transparent electrode functional design
  • Thin film sensor design and device development
  • Mini LED display circuit design and control system
Large-area micro-nano 3D direct writing photolithography technol
  • Semiconductor lithography process with 100nm resolution @ 355nm, 50nm-25μm @ 3D topography
  • Graphical area: Max 110 inches
  • Microstructure lithography depth ~ 10μm
Precision alignment nanoimprint/transfer technology
  • Roll-to-roll UV nanoimprint, precision alignment accuracy 50μm, batch manufacturing of flexible micro-nano substrates
  • Precise control of imprinting speed, tension, and forming quality, high efficiency, multi-layer structure integration
  • Substrate: PET/PC/TPU, etc., thickness 15μm ~ 250μm
Continuous nano-material filling technology
  • Flexible transparent conductive material automatic production line and additive manufacturing process supporting 10.5-generation display panels
  • Filling material: nano-metal paste
  • Electrode thickness > 5μm, surface impedance < 0.5 Ω/□
Ultra-precision electrode atomic-level manufacturing technology
  • Supports multi-metal composite electrodes (Al/Cu/Ni/Cr/Ag, etc.)
  • Sheet Resistance: 0.01~50 Ω/□, customizable design
  • Substrate thickness: thinnest 15μm, width: 1.3 m
Modular Precision Assembly/Binding Capability
  • Maximum size up to 98 inches
  • Adhesion method: Soft on hard / Hard on hard / Full bonding
  • Full bonding yield > 98%